Used ETEC Mebes 4500-5500 #9081929 for sale

ETEC Mebes 4500-5500 is an innovative mask generation and production equipment. This robust mask production system provides automated high resolution photomasks for use in micron or submicron lithography. It delivers quality CD uniformity and defect free masks for processes such as shallow trench isolation, interconnect development, and back-end of line IC manufacturing. The unit provides a range of features that support flexible and cost-effective production. These include a high-speed laser scanner and work chamber, which enable high-resolution and high-accuracy mask alignment; a software-controlled etching machine which creates masks with high CD uniformity and superior pattern uniformity; a fully programmable punching and shaping tool, which enables the efficient and precise production of final mask patterns; and a wafer handler which enables reliable mask handling and storage. Mebes 4500-5500 utilises an advanced computer-controlled software asset which provides efficient real-time monitoring and control. This sophisticated model allows users to monitor and control the entire production process, including process parameters, mask layout verification, and defective materials screening. Furthermore, the equipment provides an efficient wafer cleaning process, ensuring a clean and consistent mask surface before the alignment processes begin. The system offers a range of benefits to users, including optimised production efficiency, high yield, improved yield uniformity across the wafer, a significant reduction in mask-related defects, and increased product revenues. Furthermore, the unit can also be used to produce optimized pattern solutions for a wide range of technologies, such as advanced memory products, microelectromechanical systems, and integrated electronics. In conclusion, ETEC Mebes 4500-5500 is an advanced photomask production machine which provides users with many powerful features to produce cost-effective, high-resolution mask patterns. This precision tool offers reliable, high-quality results, and is an invaluable tool for many semiconductor fabrication processes.