Used ETEC Mebes 4500 #9087972 for sale

ETEC Mebes 4500 is a mask generation and production equipment designed for high quality lithography applications in the submicron range (ranging from 0.35µm to 10µm). This mask generation system provides superior performance for a variety of applications such as DRAM, SRAM, Flash, ASICs, and Analog/Digital ICs. The unit is comprised of two independent modules which work together to process and generate masks. The first module, Mebes 4500 Mask Generator, provides a high-precision mask pattern generator to support the requirements of advanced production on varying substrates and complex designs. Equipped with several layers of electronic components, the Generator allows for the generation of pixel-perfect masks for various manufacturing processes. The Generator offers features such as adjustable process parameters, profile compensation, and a unique 'mark-and-measure' algorithm. The second module, ETEC Mebes 4500 Mask Production Machine, is the automated production side of the tool. It is designed to automate the production of the masks using its integrated metrology and image processing systems. Using this asset, operators can detect defects on the masks and make corrections before they are printed. Additionally, it features a number of automated inspection and quality control mechanisms designed to ensure the masks can be produced to high standards. Mebes 4500 model offers a number of advantages for lithography production. For instance, the equipment's processing and production is quick and accurate, providing a precise and repeatable lithography process. Additionally, it is equipped with a number of software-based tools to create custom masks, and to optimize production processes. The automated inspection and quality control features also help reduce production times and increase accuracy. Overall, ETEC Mebes 4500 System is an ideal unit for sub micron lithography production. With its accurate generation and production capabilities, the machine offers high-quality masks and optimized production processes for various IC designs.