Used ETEC Mebes 4500 #9087987 for sale

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ETEC Mebes 4500
Sold
ID: 9087987
Super flash HTM Module P/N: 758-310000 756-311001.
ETEC Mebes 4500 is a mask generation and production equipment designed for the production of photomasks, which are very important components in the fabrication of integrated circuits. This system is comprised of several components, including a laser scanner, a power supply, a computer-aided design (CAD) software, and a vacuum assisted holder. The laser scanner utilizes E-Beam technology, which uses an electron beam to define the shape of the photomask. This process is highly accurate due to the very precise focussing and steering capability of the electron beam. In addition, the laser scanner can produce masks with very small feature sizes and complex geometries. The power supply is responsible for supplying the power required for the production of the photomask. This power is supplied in two forms: direct current (DC) and radio frequency (RF). The DC power is used to create a charge on the photoconductor surface which is then used to draw the design onto the photomask. The RF power is used to create the "plasma etching" process, which is used to make the mask patterns more permanent. The computer-aided design (CAD) software used in Mebes 4500 unit is highly advanced and versatile. It can be used to generate a variety of photomask designs and modify existing designs. The CAD software also allows for the manipulation of parameters such as power and wavelength, which can be used to create photomasks with specific electrical specifications. Finally, the vacuum assisted holder allows the photomask to be held in place during the etching process, which is necessary to ensure the mask is correctly placed during the production process. Overall, ETEC Mebes 4500 is a highly advanced and reliable mask generation and production machine. Its high accuracy and small feature size capabilities make it perfect for producing photomasks, which are an essential part of integrated circuit fabrication. Its versatile computer-aided design (CAD) software allows for modifications to the photomask designs, and the vacuum assisted holder ensures that the masks are correctly placed during production.
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