Used ETEC Mebes 4500 #9087989 for sale

ETEC Mebes 4500 is a state-of-the-art mask generation and production equipment, designed for the fabrication of integrated circuit devices. This system features superior, wide-field optical lithography tools and high speed beam writers for creating masks with highly precise dimensions. The core of the unit is a vacuum-based platform, allowing for the placement of up to five mask writers. These writers support resolutions of up to 16nm, and a field size of 100 mm x 150 mm. Specialized optics and sensors enable the machine to create masks with extremely fine detail. Mebes 4500 is equipped with beam writer and photo hyper-lithography technologies. It utilizes computer generated patterns and laser beams to create metalization edges with higher accuracy and finer resolution than traditional techniques. It also incorporates proprietary lens systems to reduce aberrations and offer improved exposure uniformity. The tool supports a wide range of materials, including resist types, dielectric materials, and other advanced materials. Sophisticated mask writers can be used to create intricate features, while other advanced technologies, such as arc stitching and T-Hill solver, make sure that the desired feature placement is faithfully transferred to the substrate. ETEC Mebes 4500 offers sophisticated control systems and hardware components with automation capabilities. The asset features an easy-to-use graphical user interface, along with data transfer links and WLAN connections, which allow the user to send job files directly from the Design House. The model also comes with an extensive library of mask writing strategies, providing users with the full set of resources to ensure maximum production efficiency. Mebes 4500 is an ideal choice for operations that demand the highest level of precision. This equipment is designed to provide maximum productivity and maximum results with minimal die scrapes, outstanding process stability and consistent mask quality. The combination of technologies and the proven history of success make this system the perfect solution for industrial mask writing and production.