Used ETEC Mebes 4500 #9087990 for sale

ETEC Mebes 4500 is a high-performance mask generation and production equipment with a comprehensive set of tools for generating and producing photomasks. It offers capabilities for a wide range of semiconductor projects, such as processor, digital signal processing, memory, analog mixed-signal, and high-speed logic. Mebes 4500 features an integrated system for mask generation and production that supports advanced mask layout services. It also includes a powerful mask design database and powerful mask inspection capabilities. The unit is fully automated and designed to enable fast mask development and high-efficiency production throughput. The machine offers selectable mask writing Tool (MPC emulators) and mask inspection asset with advanced inspection and measurement capabilities, such as pixel content analysis, automatic defect detection, fault isolation, and optical imaging capabilities. This allows users to create accurate and high-quality masks quickly, and with minimal interaction from the operator. ETEC Mebes 4500 also features advanced lithography tools designed to deliver extremely precise results. ETEC design platform offers high-speed lithography capabilities, with the latest state-of-the-art technologies such as adjustable exposure dose, controlled polarized illumination, and reduced defocus effects. This platform also includes advanced simulation capabilities for optimizing the lithographic process. Mebes 4500 is also designed with an automated mask operation model that ensures consistent and reliable operations. The equipment offers powerful tools for mask fabrication and inspection, routing, layout optimization, design-rule checking, and verification. It also offers powerful software applications and analysis programs for automated tasks, such as specifying lithography parameters, simulating, auto-fitting, and OPC. In addition, ETEC Mebes 4500 offers an extensive suite of advanced mask fabrication, test, and post-processing capabilities. The system is also designed with sophisticated data manipulation and data management tools, which allow users to quickly and easily track mask data throughout the mask production process. Overall, Mebes 4500 is a comprehensive unit that offers advanced capabilities for creating and producing accurate, high-quality photomasks. It features state-of-the-art lithography tools that support advanced mask layout services and lithography simulations. It also offers automated mask operation and data management tools, and a suite of advanced mask fabrication, inspection and post-processing capabilities. As a result, it is an ideal solution for a wide range of semiconductor projects.