Used ETEC Mebes 4500 #9088020 for sale

ETEC Mebes 4500 is a high-precision mask generation and production equipment designed for industry-grade photomask production. It is capable of producing masks with superior resolution, using a multilayer deposition process. The system features a three-axis translating stage to accurately position the substrate and a motionless, high-resolution substrate gray-level stage. This technology enables precise formation of multiple resist layers, with precise location and orientation on the substrate. Mebes 4500 is equipped with an integrated wafer-processing tool. This tool allows the photomask to be printed directly onto the required materials by resolution down to 0.25 microns. It is capable of an extremely high throughput, allowing for a large number of masks to be produced quickly. ETEC Mebes 4500 is able to produce a wide range of standard reticles and customer-specified reticle shapes, as well as inverse and positive patterns. Different patterns can be exposed with different accuracy levels, which is essential for the production of industry-grade masks. The unit also features advanced verification testing to ensure product quality. The control machine of Mebes 4500 consists of a main processor, multiple slave processors and a programmable logic controller. This design ensures high reliability and fast operation, so that the processes can be automated with minimal operator intervention. The tool is also equipped with a wide range of accessories, such as scanner and camera systems, to facilitate efficient inspection and process optimization. In conclusion, ETEC Mebes 4500 is a reliable and capable production asset that provides high precision and increased efficiency. It is easy to operate, and can produce high quality masks in a more efficient and cost effective manner.