Used QUANTRONIX DRS 840 #9148927 for sale

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ID: 9148927
Vintage: 1988
Mask repair system 1988 vintage.
QUANTRONIX DRS 840 Mask Generation & Production Equipment is a state-of-the-art device for use in the manufacture of photomasks for advanced lithography, reticle, and related processes. Its advanced design offers high accuracy and speed during the production of reticle masks, with a precision of more than 20 nanometers (nm). DRS 840 features a fully automated, full-sized system that can produce masks as small as 5 microns and as large as 22 inches square, as well as provide features and alignment accuracies in the sub-micron range. Its flexible platform can be set up to make masks for any lithography level, from 180nm to 28nm. It is also capable of intricate long and short exposure capabilities for producing leading-edge lithography, reticle and mask product designs. QUANTRONIX DRS 840 is designed to maximize throughput and reduce costs by helping to eliminate manual assembly and automated tests. It has fully automated unit components, including a multi-head mask exposure machine, mask inspection station, and mask generation and production station. These components provide efficient and reliable mask generation and production from a single, integrated machine. DRS 840 also features sophisticated ergonomic design to help keep operators comfortable while optimizing the production process. Additionally, it provides an interface for users to customize production processes. Users can use the software to adjust the mask production settings, adjust exposure parameters, and load new patterns and techniques. QUANTRONIX DRS 840 is backed by years of research and experience in the field of photolithography, and is part of a comprehensive range of mask and lithography systems offered by the company. With a wide range of options for customization, the tool is highly suitable for fabrication of advanced masks. Its advanced design, automation and customization features help to ensure cost savings, greater efficiency, and enhanced performance in mask production.
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