Used AMAT / APPLIED MATERIALS Complus 3T #9280959 for sale

AMAT / APPLIED MATERIALS Complus 3T is an advanced mask and wafer inspection equipment that utilizes an optical inspection technology to identify possible device defects. This system is capable of inspecting a wide range of mask patterns including optical reticles, masks, and wafers, and it can detect defects such as missing memory elements, double-sided pattern defects, misalignment or orientation-related defects, and off-standard pattern defects. AMAT Complus 3T unit is based on a specialized Technology of amplitude modulation that produces symmetry between a separate object and its background. The amplitude modulation technology is highly sensitive, allowing the machine to accurately identify the minuscule differences between duplicate objects and their corresponding defects. This tool utilizes a focused ion beam to draw a narrow line trace with which the asset is able to compare objects for any discrepancies. The advanced optical inspection model is equipped with advanced algorithms to identify defects. These algorithms include image capture and processing, comparison of images, and defect classification. The image capture and processing algorithms use CCD technology to capture and store moderate resolution images of the objects. The comparison algorithms employ digital processing to compare these images and provide a quantitative assessment of the object's accuracy. Lastly, the defect classification algorithms cross-reference these images against a set of previously-defined parameters, such as specifications and tolerances, to establish whether a certain object is defective. In addition to the advanced optical inspection technology, APPLIED MATERIALS Complus 3T equipment is equipped with advanced hardware components. Such components include a scanning electron microscope stage, a wafer stage, and various critical components for the operation of the system. The scanning electron microscope stage is equipped with the ability to capture high-resolution images of wafers, which allows the user to inspect multiple regions of the masks and wafers simultaneously. The wafer stage enables the movement of the wafer, so that any segment of the object can be inspected as necessary without having to move the entire object. Along with its advanced equipment, Complus 3T unit comes with software controls and user-friendly translation and transfer interfaces. These interfaces allow image capture and comparison to be carried out in any language, so that the machine can serve diverse customers. Also, the software features a user-friendly 3-D graphical interface that enables quick defect recognition and accurate measurements. AMAT / APPLIED MATERIALS Complus 3T tool is highly efficient and cost-effective, making it the perfect choice for mask and wafer inspection. With its advanced optical inspection technology, specialized algorithms, advanced hardware components, software programs, and user-friendly translation and transfer interfaces, AMAT Complus 3T is an ideal tool for ensuring quality assurance and accurate analysis of mask and wafer components.