Used AMAT / APPLIED MATERIALS Complus 4T #9276171 for sale

AMAT / APPLIED MATERIALS Complus 4T Mask and Wafer Inspection equipment is a versatile automated system designed specifically for the inspection and metrology of photomask and wafer substrates. The unit functions as a combination of process steps including defect review, automatic pattern recognition and classification, and correction of automatically detected defects. Its intuitive user interface enables efficient inspection of photomask substrates, from as small as 1.0 µm to as large as 50 µm. AMAT Complus 4T Mask and Wafer Inspection machine is capable of detecting and isolating a wide range of defects such as line widths, corners, gaps and linewidth variation. In addition, the tool provides comprehensive process control through the use of adjustable intensity setting, coordinates, microscope settings, scan frequency and scan speed. With these settings, the asset is able to detect and analyze both isolated defects and complex defects such as line-end asymmetry, over-etchings and blank areas. APPLIED MATERIALS Complus 4T Mask and Wafer Inspection model utilizes an automated stage, which is used to precisely position the wafer and photomask substrate for maximum accuracy in scanning. This stage is coupled to an integrated objective lens with a magnification range of 10x - 60x, which allows for inspection of a variety of feature sizes. The equipment features a calibration system for maintaining the accuracy of the scan settings, which allows the unit to maintain accuracy within 0.05 µm over repeated cycles. In addition to its production capabilities, Complus 4T Mask and Wafer Inspection machine supports a wide range of defect review options. This includes a variety of image capture modes for inspecting film structure and defect topology data. The tool also features a sophisticated automatic defect review asset which can rapidly analyze and sort defects based on preset thresholds. An optional defect analyzer is also available to provide additional defect classification and data analysis. AMAT / APPLIED MATERIALS Complus 4T Mask and Wafer Inspection model provides a low TCO with cost effective solutions for mask and wafer inspection. This equipment is capable of providing high-level inspection accuracy with a repeatable, reliable and user-friendly operation. All of this combined allows users to perform both mask and wafer inspections with one integrated system.