Used AMAT / APPLIED MATERIALS SemVision G2 #9160447 for sale

AMAT / APPLIED MATERIALS SemVision G2 is a state-of-the-art mask and wafer inspection system designed to perform a comprehensive suite of critical international standards tests for the area of defect analysis, yield and process optimization, photomask repair, and mask registration and alignment. The product features a powerful high-frequency electron beam (E-Beam) tool that is used for quick and accurate assessment of mask features. It also features an Automated Feature Recognition (AFR) module that is used to automatically detect patterns and defects in the image produced by the electron beam. AMAT SemVision G2 provides two-dimensional imaging of high-resolution wafers and masks, and offers a direct integration of imaging and E-Beam. This high-performance system allows for multiple-level vertical and lateral scan controls and offers fine-tune algorithms to monitor critical mask parameters. It is integrated with Allen-Bradley's Logix 5000 platform that supports process-oriented programming, allowing for easy integration within a production environment. APPLIED MATERIALS SemVision G2 features multiple mask optimisation tools: Image Match, which is used to identify similar patterns in the mask image; Auto-Align and Compare, which are used for mask registration and alignment; and various leadframe enhancement algorithms, which are specially designed to improve surface and structural characteristics. The product also includes an advanced E-Beam compositing software that allows for improved performance and better accuracy. SemVision G2 offers a unique layer-aware calibration feature that helps in optimizing stage motion. The product also offers automatic local pixel adjustment, which reduces the need for manual adjustments and eliminates possible errors. It allows for intelligent error identification and supports the latest defect classifications. AMAT / APPLIED MATERIALS SemVision G2 provides efficient wafer inspection and offers comprehensive metrology capabilities. It is compatible with various process defects, including chemical-mechanical planarization (CMP) defects, isolated particles, sub-micron particles and chemical-mechanical polishing (CMP) process uniformity. The product can handle dielectrics, including Si, as well as TaN, Ta2O5, and HfO2 layers. AMAT SemVision G2 offer a wide variety of tools that help meet the need of any high-end wafer inspection application. The product is ideal for any environment that requires fast, accurate, high-performance results. It comes with comprehensive support for the MISRA-C++ coding standard, and can be configured to comply with industry safety standards.