Used AMAT / APPLIED MATERIALS SemVision G2 #9269326 for sale

AMAT / APPLIED MATERIALS SemVision G2 is a high-precision mask and wafer inspection equipment that is suitable for use in a variety of applications related to semiconductor manufacturing. This specialized system allows users to visually inspect patterned layers on masks and wafers at both the device and systems level. It is designed to deliver superior accuracy and repeatability, with the ability to detect defects down to a resolution of 2 microns. The unit utilizes a brightfield combined episcopic/diascopic reflective microscope, allowing samples to be inspected in both oblique and direct light. The machine also features rapid LED light source for optimized viewing, with an advanced 20x/120x optical tool that is able to capture high-resolution images at up to 1280 x 1024 resolution. Additionally, AMAT SemVision G2 features a 16-million-pixel CMOS camera and an image capture card for direct image capture and storage. APPLIED MATERIALS SemVision G2 also includes a comprehensive suite of automated inspection and analysis tools, allowing users to quickly identify defects, determine precise locations, and perform detailed analysis. The asset also supports integrated line scans, enabling precise edge and line defect analysis. The model is capable of real-time auto-focus with built-in autofocus algorithms to get the best image without user adjustment. SemVision G2 also provides a wide range of measurements including edge location and peak mountain analysis, making it ideal for a variety of production processes. In addition, the equipment offers a variety of I/O capability and multiple networking options, allowing users to control the device remotely or integrate it with existing systems. Overall, AMAT / APPLIED MATERIALS SemVision G2 is a reliable and easy-to-use system for mask and wafer inspection applications. The unit provides excellent image and data quality as well as a range of automated tools and measurement capabilities. It enables fast, accurate and repeatable inspections, allowing users to quickly identify and analyze defects and features on their masks and wafers.