Used AMAT / APPLIED MATERIALS SemVision G3 Lite #9380470 for sale

AMAT / APPLIED MATERIALS SemVision G3 Lite is an inspection equipment designed to rapidly and accurately analyze defects on high-end masks and wafers. Utilizing an innovative suite of imaging, metrology, and mask inspection tools, the system is capable of detecting and measuring even the most minuscule of defects. The unit is designed with a multiplexer for simultaneous operation of both infrared and visible microscopes, providing excellent resolution with increased speed and accuracy. It pairs with AMAT SEMVision Controller for precise control over imaging parameters and automated defect detection. The machine also includes a DLA Group D scan algorithm for fast, repeatable analysis, and backward compatibility with older software platforms. The tool's ultra-high resolution imaging capabilities allow for precise detection of both surface defects and particles. It establishes a reliable base on which to evaluate any existing or emerging defect sources, enabling mask makers to quickly identify the cause of problems and fix them accordingly. Furthermore, the asset includes a powerful suite of mask inspection tools, including pattern recognition, edge detection and contour tracing, to ensure the highest level of accuracy. AMAT SemVision G3 Lite further incorporates digital low-resolution SEM (DLA Group D) scanning, pattern recognition and map-deling technologies. This combination provides a complete defect picture and a comprehensive pictures of wafer surfaces, with the ability to identify, characterize, and localize defects. In addition, the model is designed for fast setup and implementation, with an intuitive software interface that enables users to quickly and easily perform their tasks. Furthermore, the equipment can be interfaced to network-connected on-wafer metrology systems for quick, convenient analysis. Overall, APPLIED MATERIALS SemVision G3 Lite system offers users an analytical, rapid and reliable way to identify, analyze, and characterize defects on high-end wafers and masks. By using advanced imaging, metrology and mask inspection tools, the unit eliminates guesswork, providing precise results with unrivalled accuracy.