Used BROOKS AUTOMATION 3L #9197117 for sale

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BROOKS AUTOMATION 3L
Sold
ID: 9197117
Macro inspection system.
BROOKS AUTOMATION 3L is a fully automated wafer and mask inspection equipment intended for use in semiconductor wafer fabrication environments. The system is a high-resolution wafer pattern recognition platform which inspects wafer patterns and masks for defects using state-of-the-art imaging and analysis technology. The unit features an advanced dual-wavelength Renishaw laser interferometer for precision optical alignment. This ensures that each wafer is scanned accurately and that the captured image is correctly oriented with respect to the data points across the entire wafer pattern. The dual-wavelength lasers also ensure minimal errors and maximize accuracy in defect detection and analysis. 3L machine utilizes the latest pattern recognition software, allowing the tool to detect subtle variations in wafer patterns. Additionally, it can detect a wide variety of defects including scratches, pits, voids, and particles. The asset also offers a wide range of image analysis tools, allowing users to perform critical defect detection and analysis tasks. BROOKS AUTOMATION 3L model utilizes advanced edge detection algorithms to accurately detect edges, and image processing algorithms to produce ultra-high resolution images of the wafer patterns. A unique software algorithm enables the equipment to detect defects, such as particles and voids, even in complex wafer patterns. In addition to its advanced imaging capabilities, the system also includes a suite of advanced data analysis tools. This suite allows users to detect and analyze various types of defects and analyze process variations. The unit also offers a comprehensive database of archived data, allowing users to quickly and accurately identify and assess potential process variations. In short, 3L is a high-performance wafer and mask inspection machine designed for use in semiconductor fabrication environments. The tool features advanced optical alignment technology, pattern recognition, image processing capabilities, defect detection and analysis algorithms, and a comprehensive database of archived data. As such, the asset provides highly accurate and reliable results, enabling users to quickly identify and address potential process variations.
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