Used DCG SYSTEMS / CREDENCE EmiScope III #9117179 for sale

DCG SYSTEMS / CREDENCE EmiScope III is an advanced semiconductor mask and wafer defect inspection equipment. The system is designed to discover defects in photomasks used in semiconductor manufacturing processes and on silicon wafer surfaces. It uses innovative technology to perform high resolution inspections at fast scan rates for the most complex semiconductor mask designs. CREDENCE EmiScope III unit utilizes the latest development in lens technologies and optical imaging systems to achieve excellent image clarity and accuracy in mask and wafer defect detection. It features a high performance digital line scan camera with an ultra-large field of view to provide a detailed wide area coverage for high resolution mask and wafer defect detection. The machine also incorporates a 5 degree flexible tilt platform, high zoom range and Servo Motor control for micro inspection applications. DCG SYSTEMS EmiScope III eliminates the need for manual inspection by automatically detecting defects in a short amount of time. This tool is equipped with KLA's advanced defect detection algorithms, providing fast, accurate classification of mask patterns, test structures and surface mount components. It generates results in the form of comprehensive summary reports, enabling users to easily identify and measure defects. In addition, EmiScope III asset's interactive software suite allows users to quickly modify inspection parameters and to view defect results in real-time. It facilitates alignment and focus operations to ensure maximum image quality. The model also offers automated shutter control to reduce undesired exposure and electromagnetic interference (EMI) susceptibility. DCG SYSTEMS / CREDENCE EmiScope III is designed to deliver excellent performance and accuracy in mask and wafer defect inspections. This equipment provides fast defect discovery in a wide variety of semiconductor mask designs and on complex silicon wafer surfaces. Its advanced optical imaging technology and defect detection algorithms make it an ideal choice for process improvement and quality assurance.