Used FUJI F-601 #9271421 for sale

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FUJI F-601
Sold
Manufacturer
FUJI
Model
F-601
ID: 9271421
Laser interferometers.
FUJI F-601 is a mask and wafer inspection equipment designed to inspect wafer patterns and masks on a microscopic level. It includes a unique light source combined with a highly sensitive camera and imaging systems. It is capable of achieving a resolution reaching 0.05 microns for pattern and mask checking, improving the accuracy of the inspection process. F-601 uses a built-in laser-diode based light source for its illumination, with a wavelength of 633nm or 532nm. This light source is adjustable so that the intensity and the angle can be adjusted to accommodate the size and shape of the parts being inspected. Its high-sensitivity CCD camera is capable of capturing images with a resolution of 0.05 microns, allowing for a detailed examination of each inspection area. FUJI F-601 is equipped with an advanced pattern recognition feature which determines the occurrence of imperfections by comparing the inspected area against a predetermined reference. It is also capable of inspecting varying particle size and contrast levels to identify contaminants which may affect the reliability of production assemblies. The image quality achieved with F-601 is superior to any other inspection system available, with no visible pattern distortion or blur. The diagnostic software incorporated with FUJI F-601 allows for the results of the inspection process to be recorded and displayed on a high-definition monitor. Its dual-monitor unit gives the user and operator access to real-time images from two different angles, allowing for greater accuracy in the process. F-601 features external port connections for external peripherals, ensuring greater compatibility with third-party software. For effective process management, a Box-Targeting feature is available, as well as a hard-disk recorder so that operations can be tracked, reported and analyzed. FUJI F-601 is a reliable and accurate inspection machine which is capable of high-resolution analysis of mask and wafer patterns. Its advanced features, clear images and unparalleled accuracy make it a great choice for assessing the quality of any production process.
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