Used J-MAR S2610-01-N #9249766 for sale

J-MAR S2610-01-N is a fully automated mask and wafer inspection equipment. It is designed for high-precision optical inspection of wafers, reticles, and masks, and to ensure that they meet the highest possible quality standards. The system consists of three parts: an illumination unit, an imaging machine, and image processing software. The illumination tool uses a low-power, low-emission laser for uniform, non-disruptive illumination. This ensures clear, well-defined images with a minimum amount of noise interference. The imaging asset includes two synchronously moving lines-of-sight selected from an array of nine. These lines-of-sight allow the model to capture high-resolution images of the wafer or mask while controlling light power and optical path. The image processing software performs pattern recognition and allows for annotation and reviewing of the images. It also includes features such as adjustable inspection parameters, threshold values, and user-defined inspection masks. S2610-01-N is a cost-effective solution for mask and wafer inspection. It is easy to install and operate, and can be customized to meet specific inspection requirements. Furthermore, its advanced optical and image processing capabilities make it an ideal solution for high-resolution imaging of even the most intricate patterns.