Used KLA / TENCOR 2132 #9161994 for sale

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KLA / TENCOR 2132
Sold
ID: 9161994
Vintage: 1992
Wafer inspection system 1992 vintage.
KLA / TENCOR 2132 is an advanced mask and wafer inspection equipment designed for high sensitivity and accuracy. The system uses patented Fourier Transform Interferometry (FTI) technology for defect detection and classification, and includes an integrated defect review, fault isolation and pattern recognition unit. The unit features a user-friendly graphical user interface, as well as advanced imaging and analysis capabilities. The mask and wafer inspection machine consists of three major components: the scanner, imaging tool, and image-processing systems. The scanner is an FTI-based high-resolution imaging asset capable of capturing both top-down and cross-section images of wafers. This ensures that the defects are accurately detected, identified and resolved. The imaging model includes an advanced optical microscopy technique, which is capable of bringing out the fine detail of the wafer's surface. The equipment also includes a simulation module that allows users to accurately map out a planar surface and predict the impact of defects. The image-processing systems are engineered to detect and classify defects according to category and size. It also separates them into various defect classes. It classifies the shapes, sizes, and intensities of the defects, and can also recognize and differentiate commonly seen features such as dots, lines, curves, hollows, and islands. The system can easily detect anomalies within the wafer and helps determine which ones need further inspection or repair. The defect panel resolution is 0.5µm, with the ability to detect at the pixel level. The unit also has the capability to classify defects based on size, shape, topology, orientation, and relative motion. The gate map feature allows users to view thresholding, filtering, and identification of critical defects at their sample location. The machine also includes an automated defect review function. This allows for an automated comparison between the expected and actual results, so any discrepancies can be quickly identified. A micro-level fault isolation tool is also included, which helps reduce potential missed defects or false-positives. Finally, the unit offers a powerful pattern recognition asset. This provides users with a comprehensive view of the wafers, as well as the ability to detect and classify more than one defect pattern at a time. For example, it can differentiate between different types of patterned defects such as shorts and opens. KLA 2132 mask and wafer inspection model is designed to provide users with a powerful equipment for inspecting, analyzing and repairing mask and wafer defects. Its advanced imaging and image-processing capability allow for a highly sensitive and accurate method of defect detection and classification. The automated defect review and pattern recognition systems help reduce potential missed defects and false positives, making this system ideal for ensuring the highest quality of products.
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