Used KLA / TENCOR 2350 #9184410 for sale

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KLA / TENCOR 2350
Sold
ID: 9184410
Wafer Size: 8"
Vintage: 2001
Imaging inspection system, 8" Type: SMIF Robot: Dual SMIF EFEM, 8" GEM SECS and HSMS Signal light tower XENON Lamp: 150 W Wave length illumination: 370 ~ 720 nm Wave length band: Visible, UV, I-line Pixel size: 160 ~ 250 nm Stage: X, Y, Theta (48) IMC Boards MM2M and MM2S Missing parts: UI Main power cable SOC Solenoid 2001 vintage.
KLA / TENCOR 2350 is a state of the art mask and wafer inspection equipment designed specifically for the semiconductor industry. The system is specifically designed to inspect for contaminants, defects, and other defects that may impact the performance of a chip or wafer. The unit uses a combination of advanced optics and digital imaging technology to examine both front and back surfaces of the mask or wafer, making it one of the most comprehensive inspection systems available. KLA 2350 utilizes four cameras to achieve precise 3-D imaging and precise defect location. The machine uses four-wavelength illumination — three brightfield, one darkfield — for a variety of inspection modes, allowing for precise detection of such defects as particles, scratches, cracks, pits, and other irregularly formed particles. The tool's high-end optics also make it well suited to the precise detection of wet particles. TENCOR 2350 features a broad range of features to ensure easy and precise inspection. These features include automatic loading and unloading of the mask and wafer, advanced pattern distortion detection, multiple illumination levels, and a light control asset. The model also includes advanced software for defect analysis and reporting, enabling users to quickly identify and troubleshoot any issues. 2350 also provides protection against in-process contaminants, such as particulate and liquid contaminants. Its built-in contamination avoidance equipment screens out any incoming particles from the inspection area, and can even detect particles that have already entered the system. This ensures the safety of both the wafer and the sample material. Overall, KLA / TENCOR 2350 is a highly advanced, flexible mask and wafer inspection unit. Its superior optics, digital imaging systems, and advanced software make it ideal for pinpointing and addressing contamination and defects. The machine's detailed real-time reporting and advanced imaging tools enable users to achieve the highest levels of product quality.
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