Used KLA / TENCOR 2350 #9254021 for sale

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KLA / TENCOR 2350
Sold
ID: 9254021
Wafer Size: 8"-12"
High-resolution imaging inspection system, 8"-12".
KLA / TENCOR 2350 is a mask and wafer inspection equipment designed for the most demanding requirements of semiconductor manufacturing. With its advanced optical system, superior imaging performance, and integrated particle detection, KLA 2350 provides a comprehensive solution for defect inspection and metrology. TENCOR 2350 utilizes high-speed, high-resolution imaging cameras to capture a brightfield image of the mask or wafer. These detailed images are then analyzed on a real-time basis for defects, including pattern variations, line width, and other non-conformances. The unit also incorporates a sophisticated particle detection machine, enabling it to detect particles on even the most intricate surfaces. 2350 features an advanced optical tool that is capable of delivering both high numerical apertures and high magnification magnifications. This combination of features is exceptionally well-suited for mask and wafer feature inspection. Additionally, the lighting asset includes a front and backlight configuration, allowing for optimum visualization of geometric features, surface contaminants, and defects. KLA / TENCOR 2350 is powered by a highly-sensitive digital signal-processing model. This equipment utilizes algorithms to perform defect classification and to produce highly accurate defect measurements. The system also works in a closed-loop fashion, allowing for continuous defect monitoring and improving overall inspection accuracy. KLA 2350 is capable of measuring a variety of features, including line widths, sidewall angles, and other pattern-related defects. The unit can also be used to detect foreign particles and materials, as well as calculate overlay accuracy. Advanced reporting capabilities also allow users to store data for easy retrieval, generate real-time reports, and communicate results with other tools. Overall, TENCOR 2350 is a powerful and reliable mask and wafer inspection machine that is designed to meet the most challenging requirements of semiconductor manufacturing. With its advanced optics, superior imaging capabilities, digital signal-processing tool, and integrated particle detection, 2350 provides a comprehensive solution for defect inspection and metrology.
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