Used KLA / TENCOR 2438 Viper #9399303 for sale

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ID: 9399303
Wafer Size: 12"
Vintage: 2008
Macro defect inspection system, 12" Review module (3) Load ports Wafer transfer robot 2008 vintage.
KLA / TENCOR 2438 Viper Mask and Wafer Inspection Equipment is a state-of-the-art, vision-based inspection system designed to meet the demanding needs of the microelectronics industry. KLA 2438 Viper provides superior inspection accuracy and high throughput rates, enabling the most advanced process control and reliability requirements. TENCOR 2438 Viper unit's main components include a high-resolution digital camera, high-precision robotic stage, ImageTool software, and control hardware. The camera's 5-megapixel CMOS sensor collects high-resolution images of both masks and wafers, with a pixel size of 2.6 µm. The robotic stage can accurately move sample substrates throughout the inspection area and utilizes automated calibration to ensure accuracy and repeatability. Its advanced ImageTool Software is an integrated suite of automated inspection and measurement algorithms designed to quickly and precisely assess both masks and wafers for defects, wear, and other features that cause yield loss and non-uniformity. The software features an intuitive graphical user interface, customizable runtime profiles for rapid, repeatable inspection, and integration with downstream analytic and review tools. Control hardware in 2438 Viper machine includes an intuitive user interface, motion and coding controls, tool safety management, and integrated local and remote diagnostics. The software's alarm and reporting functions alert the user to anomalies and allow in-depth analysis of asset performance. KLA / TENCOR 2438 Viper Mask and Wafer Inspection Model provides reliable, detailed machine-generated information on wafer yield, defects, and process performance. Its automated features reduce manual operator intervention, ensuring rapid, repeatable inspection performance, and its high-resolution imaging and analysis capabilities enable thorough analysis and closed-loop feedback for improved process control and increased yield.
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