Used KLA / TENCOR Archer AIM #9097080 for sale

KLA / TENCOR Archer AIM is an innovative mask and wafer inspection equipment that provides advanced defect detection, particle characterization, and precision wafer-level image analysis. Using a high-resolution camera, coupled with advanced image processing software, KLA Archer AIM creates a full 3-dimensional representation of the surface of a photomask and/or wafer, allowing for precise defect detection, accurate image analysis, and precise particle characterization. TENCOR Archer AIM enables precise edit and defects mapping capabilities, as well as providing a comprehensive wafer map. This map is used by users to track and analyze the placement, shape, and size of defects and particles found on the wafer surface. By accurately measuring and tracking defect geometries, Archer AIM is a powerful tool to improve defect-tolerance of advanced-node devices, reduce defectivity, and increase product yields. Uniquely, KLA / TENCOR Archer AIM's beam profiling system also utilizes an advanced beam-shift technique and specially designed optics to measure beam size, pointing, and astigmatism on the mask and/or wafer. This is done by displaying an array of different spots, known as "spot populations," which represent all the different types of defects that may be present. With this beam profiling feature, KLA Archer AIM can accurately and quickly diagnose problems with overlay accuracy as well as any problems with diffusion and lithography. TENCOR Archer AIM also has a particle metrology unit, which uses a fast-scanning camera, coupled with a variety of image sensors, to quickly and accurately determine the size and shape of particles on the mask and/or wafer surface. By combining multiple inspections of different types of defects in one-step, it helps to reduce inspection cycle time and total cost of ownership. Archer AIM is equipped with an integrated data visualization machine, allowing users to review and assess defect performance and control trends, as well as analyze process drift, to help drive yield improvement. The tool is designed to help device manufacturers achieve their goals of shrinkage, boosting device performance, and enabling new process nodes. In summary, KLA / TENCOR Archer AIM is an advanced mask and wafer inspection asset that provides precise and detailed defect detection, particle characterization, and precise wafer-level image analysis. By enabling edit and defects mapping, beam profiling, and particle metrology, KLA Archer AIM is a powerful tool to improve device manufacturing yields, making it an invaluable tool for device manufacturers.