Used KLA / TENCOR Archer AIM+ #9186704 for sale

KLA / TENCOR Archer AIM+ is a next-generation mask and wafer inspection equipment designed to provide high-performance metrology tools for advanced semiconductor technologies. The system supports multi-sensor measurements, using an advanced imaging technology for cost-effective detection of defects and pattern placement accuracy in the nanometric level range. It features a unique pattern recognition capability that provides powerful solutions to quickly and accurately identify high-aspect-ratio features such as gate arrays. The unit utilizes KLA high-resolution imaging technology to ensure high-contrast images with accurate alignment, tilt, and resolution requirements. Moreover, it enables simultaneous inspection of wafer topography and global metrology, facilitating reliable detection of patterning errors on high-aspect-ratio features. The machine utilizes programmable edge detection, subpixel segmentation, and shape filtering algorithms for both visible light and laser-illuminated light images for accurate identification of defects regardless of their size, as well as for pattern placement accuracy in the nanometer range. The tool operates in a clean room environment, providing a wide range of environmental settings including humidity and temperature. Its accelerated cooling and heating functions enable quick adjustment of measurements to conform to the latest international standards. The combination of the asset's high throughput and accuracy makes it an ideal choice for production lines. It features user-friendly GUI, which simplifies operation and data analysis. As the model is supplied with a suite of perfectly matched calibration types, users do not have to waste time on tedious manual tasks. Moreover, it offers a real-time analysis capability which helps identify, classify, and track all defects. To guarantee accuracy and repeatability in each inspection, the equipment utilizes automatic focus algorithms and tool recognition. The software includes a sophisticated library of features and rules to accurately identify defects and enable fast defect detection. Overall, KLA Archer AIM+ is an advanced, high-performance mask and wafer inspection system which provides detailed metrology of the most advanced semiconductor patterns. Its reliable results along with its user-friendly interface, fast, and flexible operation make it an ideal choice for various production needs.