Used KLA / TENCOR EFEM #9276609 for sale

KLA / TENCOR EFEM is a mask and wafer inspection equipment featuring a full-field, defect-detection capability. With the integration of its unique optical design, robust hardware design, and advanced image processing, this system offers superior accuracy and repeatability in quality assurance inspection. The unit utilizes KLA patented Multi-Scan enhanced laser beam imaging and advanced optical imaging technology to reveal detailed surface information and sub-micron defects. The high-precision optical hardware ensures that defects and imperfections are detected and characterized in fine detail. Integrated abrasive light-filtering technology eliminates image artifacts caused by ambient light, enabling optimal imaging of every mask and wafer. The machine also features a high-resolution camera head, high-precision zoom optics, top-of-the-line autofocus tool, and powerful image processing algorithms that provide unmatched performance and analysis. In addition, the asset's patented compact KLA EFEM technology offers a comprehensively integrated inspection platform that includes pattern recognition and mask generation, fast field-spot detection and correction, defect detection and classification, wafer-to-die comparison, plus special edge recognition. At the same time, the model utilizes self-learning affinity data matching and pattern analysis algorithms to capture discrepancies in edge transition or alignment and halftone inspection. This ensures that actual mask performance is evaluated accurately and in real time. TENCOR EFEM equipment also features a suite of automated inspection and analysis software that allows for the integration of a variety of custom-designed quality control metrics and manual review tools. In addition, the system offers a range of traceability and tracking capabilities, enabling operators to quickly and accurately check production data and inspect results for proper adherence to established standards. Overall, EFEM unit provides exceptional accuracy and repeatability in the quality assurance of masks and wafers. This powerful and versatile solution allows manufacturers to ensure quality in their products, as well as save time and money.