Used KLA / TENCOR Terascan SL 536 #9363034 for sale

KLA / TENCOR Terascan SL 536 is a state-of-the-art mask and wafer inspection equipment optimized for a range of applications in the semiconductor fabrication industry. Its patented array image sensors and advanced optics are engineered to detect and analyze the smallest defect sources on a variety of mask and wafer substrates, including silicon wafers, thin film solar cells, photomasks, and reticles. The high-speed, high-resolution KLA Terascan SL 536 delivers unmatched levels of accuracy and reliability, detecting even the most complex defect sites. The system is capable of measuring up to 512μm over the entire wafer simultaneously, using high-precision interferometry, CCD and CMOS technologies. Its patented 1.5X image magnification and advanced illumination unit ensures that TENCOR Terascan SL 536 provides distributed illumination for the highest SNR and the most detailed imaging. Terascan SL 536 also features automated rough alignment and scanning stations for the efficient handling of a variety of wafer types and shapes. Its wafer-level positioning and alignment data allow it to error map the wafer surface to determine the exact location of detected defects. It is equipped with an advanced pattern recognition feature that automatically recognizes known masks for fully automated defect-detection. Its advanced software and hardware tools employ high-speed data processing algorithms to rapidly and accurately detect various kinds of defects such as dislocations, ripple marks, pits, bright spots, and voids. The user-friendly GUI of KLA / TENCOR Terascan SL 536 simplifies the operation process so users can quickly acquire the desired information. An ergonomic, high-resolution, touchscreen interface allows for easy user interaction, and the machine can enable secure data transfer for quick sharing of information between plants and facilities. KLA Terascan SL 536 is highly efficient, analyzing masks and wafers within minutes. It offers the best image quality, ensuring productivity increase, heightened defect detection, and improved yields for mass production.