Used LEICA / VISTEC INS 3300 #9196670 for sale

LEICA / VISTEC INS 3300 Mask & Wafer Inspection Equipment is an advanced inspection system designed to detect defects in integrated circuit masks and wafers. The unit is capable of displaying defects on the production line in real-time while assisting the end-user to correct the root cause. Utilizing the latest in pattern and topological recognition, this machine can detect a variety of defects in a wide range of structural geometries, ensuring high product quality. LEICA INS 3300 tool features a 3 million pixel high resolution camera and a 300mm lens. This powerful imaging solution is coupled with a sophisticated image processing algorithm, enabling the asset to detect miniscule defects in the most intricate patterns. The camera sensor and image processing algorithm are optimized for ultra-precise evaluation of the surface topological conditions, giving the user an unparalleled level of detail in the analysis. The model's advanced pattern recognition capabilities allow it to quickly identify any missing or misplaced features, or any physical defects such as scratches, particles, etch pits, and so on. The equipment is capable of scanning at a rate of 4,000 pixels/second, delivering a high throughput and fast turn-around time. In addition to providing rapid defect detection, VISTEC INS 3300 Mask & Wafer Inspection System is intuitive and easy to use. The unit's user interface is designed for easy navigation, giving the user complete control over the inspection settings and process. The user interface also includes powerful statistical functions, enabling the user to perform sophisticated analyses quickly and efficiently to identify production or process related issues. INS 3300 machine is designed with integrated feedback control systems, allowing it to be automatically adjusted in response to the incoming signal. This ensures that the device continues to reliably and accurately detect the slightest defects without the need for manual adjustment. Finally, the tool includes a powerful set of security features and tools to protect the sensitive data that is being processed. Protected with advanced access control, data encryption, and a firewalled network connection, data security in LEICA / VISTEC INS 3300 asset is top-notch. In sum, LEICA INS 3300 Mask & Wafer Inspection Model is an advanced, yet user friendly defect inspection equipment that effectively detects a wide variety of defects with accuracy, reliability and security.