Used LEICA / VISTEC INS 3300 #9200028 for sale

LEICA / VISTEC INS 3300 Mask & Wafer Inspection equipment is a powerful and reliable tool for detecting and evaluating defects in various substrates, including semiconductor wafers, masks, and flat panels. It features advanced optical sub-micron resolution and automated mapping and analysis capabilities, which makes it ideal for detecting very small defects and areas of low contrast that are otherwise difficult to detect. The system is designed for high-throughput production environments and can process hundreds of samples per hour. It features a full range of automated inspection tasks, including automated defect characterization, automated pattern identification, and automated defect detection. The unit's high-resolution imaging capabilities enable users to inspect the full range of device and interconnect features on the substrates being inspected. The machine consists of several components. The Mask Arrangement Tool enables users to set up the inspection to identify structures on a mask for comparison with a corresponding image. The Workbench is the control interface for managing all of the inspection tasks. The automated scan positioners provide precise, high-speed movement of the mask within the field-of-view. The tool's inspection technologies range from multiple 'white-light' illumination techniques to infrared, as well as specialized illumination modes. The asset is also equipped with specialized algorithms to enable automated detection of stencil and solder ball defects. In addition, the model can be configured to perform lamination inspection of stacked die. The equipment is designed to handle a variety of substrates, from non-semiconductor materials to ultra-sensitive built-up resistors. This versatility makes the system suitable for a wide range of applications in industries such as biomedical, nanotechnology, aerospace, and optics. Inspection results are displayed on the unit's user interface, which displays an intuitive and interactive graphical representation of the results. This includes easy-to-publish defect diagrams and automatic defect reporting capabilities that provide detailed information regarding test parameters and defect results. LEICA INS 3300 Mask & Wafer Inspection machine is an advanced and reliable tool for defect detection and analysis. Its automated features, coupled with its high-resolution imaging capabilities, enable users to detect very small defects and areas of low contrast in a variety of substrates. Furthermore, the tool's user interface provides an intuitive and interactive graphical representation of the defects, making defect analysis and reporting a straightforward and streamlined task.