Used LEICA / VISTEC INS 3300 #9225703 for sale

LEICA / VISTEC INS 3300 is a mask and wafer inspection equipment that utilizes high resolution imaging to detect defects in selenium based semiconductor components. With its advanced optics capabilities, the system can achieve resolution of 0.3μm or below, making it ideal for almost any application requiring high-appraise imaging. The unit can detect various types of defects ranging from scratches and pitting to micron-level resolution for small or difficult to inspect features. Additionally, the user can select from various inspection parameters including voltage, contrast, brightness, zoom, and focus to achieve accurate results. LEICA INS 3300 is designed to simplify the process of mask and wafer inspection. It makes use of high-grade imaging and processing systems that deliver powerful capabilities in terms of efficiency and accuracy. A primary strength of the machine is its fast scanning speed which can reach up to 10KHz. This ensures that even complex objectives can be scanned quickly. It also features a set of specialized imaging capabilities such as Line Replacement Technology (LRT) and Edge Detection that can detect the smallest of details and provide sharp imaging. In addition, the tool is engineered for accuracy through Automated Feature Find (AFF). This allows for precise defect detection by auto-detecting specific features. Furthermore, the asset is supported by a comprehensive Measurement Analysis (MA) which is designed to eliminate false signals and false positives that are often observed in other systems. VISTEC INS 3300 is an invaluable tool for semiconductor mask and wafer inspection. It is easily configurable and can provide exceptional performance in even the most demanding applications. With its advanced optics, robust imaging and processing, and comprehensive defect detection capabilities, the model is ideal for customers requiring the highest level of quality assurance.