Used LEICA / VISTEC INS 3300 #9242162 for sale

LEICA / VISTEC INS 3300 is an advanced mask and wafer inspection equipment designed to identify and analyze surface defects on flat panel displays, semiconductor wafers, photomasks, and other similar substrates. The system utilizes powerful imaging optics and automated defect detection algorithms to provide precise and accurate detection, classification, and quantification of defects down to the sub-micron level. The unit features an ergonomic design to enable efficient and comfortable operation by lab technicians. Its advanced optical machine is capable of generating in-line images of high-resolution substrates via both transmission and reflected light. It can be configured for single- or multi-axis scanning to enable inspection of large substrates. The tool also includes a robust firmware package providing intuitive graphical user interfaces, automatic feature alignment, automated defect detection, and real-time analysis of results in accordance with industry-standard defect metrics. LEICA INS 3300 also features a wide variety of accurate, repeatable, and reliable imaging, sorting, and analysis parameters. These parameters include lighting selection, exposure timing, image thresholds, defect size limits, average contrast, expanded range, particle size limits, background subtraction, particle inclusion parameters, and spot detection. The asset's multi-mode feature set makes it suitable for both industrial applications and laboratory use. The model's defect characterization results can be reported as both absolute values and as measured or estimated values relative to a "perfect" specimen. This makes the equipment ideal for inspecting specimens which have feature to feature variations in size and shape due to the manufacturing process. In addition, the system offers a wide range of output formats, enabling compatibility with data formats used by other systems and enabling easy integration with other unit components. This facilitates a straightforward process for generating comprehensive reports and creating accurate comparison measurements between different substrates. In conclusion, VISTEC INS 3300 is an advanced mask and wafer inspection machine that provides the precision and accuracy necessary for automated defect detection, classification and quantification. The tool provides comprehensive output capabilities, user-friendly operation, and results which are compatible with industry-standard defect metrics. It is an ideal tool for industrial applications and laboratory use.