Used LEICA / VISTEC INS 3300 #9266076 for sale

LEICA / VISTEC INS 3300 is a high performance mask and wafer inspection equipment, developed by LEICA Microsystems and VISTEC Semiconductor systems GmbH. It is designed to ensure complete accuracy and consistency in the process of detecting, inspecting, and measuring all characteristics of integrated circuits, such as defect size and type, while ensuring low cycle times and cost. LEICA INS 3300 provides leading-edge performance and accuracy with its high numerical aperture lens, using a combination of 0.65NA and 0.45NA objectives for superior image resolution and reliable defect detection. With a full frame image size of 21 x 21mm, it provides complete coverage of the IC, delivering a greater field of view and higher productivity. The system features enhanced automated optics control and autofocus functionality to ensure reliable results, eliminating the need for costly manual adjustment and enhancing the accuracy of the measurements. The unit also supports different operating modes, such as low-light contrast and luminance contrast, to ensure optimal detection of transistor gate openings and other microscopic defects. The machine can further be used to detect, analyse and report structural defects, such as line width and spacing variations, as well as particle defects and residues, giving a complete picture of the wafer. The advanced EasyPrint feature allows for fast and accurate printing of inspection images to either hard or soft media. The tool also features a range of connectivity options, such as Ethernet, USB, and GPIB, for convenient integration with other instruments. VISTEC INS 3300 is the ideal solution for cost-effective and reliable mask and wafer inspection. It provides a combination of exceptional speed and accuracy, for a range of applications, making it an ideal choice for semiconductor manufacturers looking for reliable and cost-effective wafer inspection solutions.