Used LEICA / VISTEC INS 3300 #9268833 for sale

LEICA / VISTEC INS 3300 is a high performance mask and wafer inspection equipment designed to meet the stringent requirements of integrated circuit production and inspection in cleanrooms. It is equipped with a unique multi-angle shadow projection system for the visualization of critical dimensions and geometries, allowing for unmatched defect coverage. The integrated inspection algorithm utilizes powerful imaging technology for high-resolution mask and wafer review. This unit provides superior quality assurance while effectively increasing yield. LEICA INS 3300 features a modular architecture with a high throughput of 28 wafer maps/min, allowing for parallel defect inspection on multiple substrates. In addition, it contains a number of advanced metrology functions that measure critical dimensions of complex structures. It is equipped with a 5-axis motion machine that allows for complex patterned structures on the edges or backside of substrates to be quickly inspected and measured. The robust design of the tool ensures reliability and enables it to be used in a variety of industrial environments. VISTEC INS 3300 is also designed with an encompassing regulatory environment in mind. It is compliant with Industry 4.0 standards, meaning it is capable of communication and integration with a number of systems. This includes Industry 4.0 enabled inspection routes and robotic automation for loading and unloading of substrates or movement of the asset. INS 3300 is equipped with a large touchscreen display making it easy for even novice users to navigate with ease, allowing for superior user experience. It contains sampling and FOV control for inspection, automatic defect classification, calibration, QC tests, alignment modes, clip printing as well as detailed reports and data exchange capabilities. In addition, the user flexible software model allows for customization according to specific needs. LEICA / VISTEC INS 3300 is a robust and flexible tool for high performance mask and wafer inspection in IC production and inspection. Its unique multi-angle equipment offers advanced metrology functions to achieve high-fidelity visualization and unlock higher yield. Industry 4.0 enabled communication and integration with other systems ensures that it is future-proofed and compliant with current standards. With its robust design and large touchscreen display for ease of use, LEICA INS 3300 is the ideal choice for advanced mask and wafer inspection.