Used LEICA / VISTEC MIS 200 #77516 for sale

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ID: 77516
Wafer Size: 8"
Vintage: 1992
Inspection system with Ergoplan microscope, 8" Power requirements: 220VAC single phase, vacuum Total hours: 41466 Configuration: ICR Filter 573098 ICR Filter 573097 Leitz Periplan GW 10x/26 High focal point M eyepieces Leitz PL FLUOTAR 5X/0.12 Leitz 567015 */- LP FLUOTAR 10X/0.25 D Leitz 567017 */0 PL FLUOTAR  50X/0.85 D Leitz 567024 */0 PL APO 100X/0.90 D Leitz 567043 */0 PL APO 150X/0.90 D Stage 026-407.144/20606 with removable 7.5" x 7.5" Vacuum Chuck insert Joystick 301-3603147/283  572086 RMX-Controller Computer 301-364.081/00158 Power distribution box 301-364.060/169 208/230VAC 50/60Hz 10A 2100VA Stage Drive 301-365.001 1992 vintage.
LEICA / VISTEC MIS 200 is a sophisticated mask and wafer inspection equipment used in the semiconductor industry. The system utilizes best-in-class optical inspection technology, coupled with outstanding optics and imaging tools, to provide accurate, reliable, and repeatable results. The unit is specifically designed for photomask inspection and its high magnification capabilities, flexibility and advanced color imaging technology makes it the most comprehensive mask inspection machine available. The tool utilizes advanced optics technology designed to provide outstanding image quality and resolution, producing a wide variety of inspection results for a wide range of sizes, shapes and materials. The asset has a modular design and uses a variety of optical capabilities including 5x to 40x native magnification for imaging/inspection (zoom range up to 500x), fiber-optic illumination, brightfield, darkfield and oblique illumination, as well as automated darkfield and brightfield inspection. The model interfaces with the imaging and analysis software suite, ARRIANA LAB, to enable real-time defect review and optimization of opaqueness, edge-pull, detailed imaging and other applications. The equipment features automated image acquisition and auto-focus capabilities, robust color management and advanced pattern recognition software. It also features multiple image view (MIV) technology which allows for simultaneous viewing of multiple images, to provide quality assurance and defect analysis. The system is equipped with a full-function client/server networking architecture that enables quick and easy data sharing between mask and other diagnostic tools. The unit includes a proximity effect correction (PEC) package which accurately simulates the effect of imaging artifacts such as those caused by dust and scratches. The machine can also be used for inspection of wafers, parts, and assemblies. It offers high resolution imaging and low-light capabilities to detect minute particles, scratches, and other anomalies that may occur during wafer processing. Its advanced analysis capabilities enable users to quickly identify and correct potential issues. LEICA MIS 200 is an invaluable asset to semiconductor manufacturers, as it helps ensure safe, reliable and high yield production. It is ideal for production, quality control and failure analysis applications, providing excellent performance and quality control results.
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