Used METRICON PC 2010 #9084282 for sale

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METRICON PC 2010
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ID: 9084282
Prism Coupler Dual Laser Film Measurement System Updated software Dual Wavelength: 633nm and 1551nm Unparalleled accuracy in measurement of thin film thickness and refractive index Bulk refractive index and thin film/bulk birefringence Includes PC and new software.
METRICON PC 2010 is a mask and wafer inspection equipment intended for use in photolithography masking and wafer fabrication. The system inspects the quality of photomasks and wafers based on their reflectance profile (optical reflectance of 400-750 nm) and provides a report with a representative reflectance profile in a full visible spectrum for each sample. The unit is designed to detect materials defects in photomasks and produce inspection reports on wafers of all sizes. It features an advanced optical reading machine and a custom 100x descanning and imaging platform that can inspect dies up to 200mm using Tri Stack based illumination. The tool consists of a wafer stage, an optical head, and a computer asset running METRICON Image Analysis Software package. The optical head contains a backlight scanner that consists of a 100x objective lens and a number of light sources including green, red and IR LEDs. The objective lens is mounted on a Y-table, with an XY translation stage and X-axis rotation stage. This allows the light source to be scanned across the sample, while the sample is fixed on the wafer stage. The wafer stage is made of two adjustable tilt & rotation stages, a fixation chuck and a vacuum pick-up holder. The wafer stage also features a mechanical and electromagnetic stage calibration model. METRICON Image Analysis Software is a powerful image analysis and comparison software package. It features an automatic global graphing technique that provides an individual reflectance profile for each sample, allowing it to compare the light and dark levels of the sample accurately. The software also includes a defect mapping application that allows users to map features of their samples in both visible and invisible range. The software can also automatically measure wafer thickness across the entire surface, and discern between spatial and time-based errors. Overall, METRICON PC 2010Mask & Wafer Inspection Equipment is an advanced system that allows users to inspect mask quality and produce wafer inspection reports quickly and accurately. Thanks to its scanning and imaging capabilities, it provides an accurate measurement of both light and dark regions of the samples. Furthermore, the built-in image analysis software makes it easy to compare multiple samples and map out surface defects. As such, the unit is a valuable tool for quality assurance and production processes in the photolithography industry.
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