Used MPD MSP-2300XPI #9231858 for sale

MPD MSP-2300XPI mask and wafer inspection equipment is a state-of-the-art system designed for the inspection and review of masks and wafers used in semiconductor processing. It is based on high-resolution digital imaging and high-speed inspection algorithms in order to ensure the highest accuracy and defect detection in both planar and 3D surfaces of various wafer sizes. The unit utilizes an array of advanced digital imaging techniques, such as bright-field and dark-field, backlight, and phase shifting, to capture 2D images of the surfaces in order to detect, analyze, and verify patterns for alignment and defects. Digital images are further enhanced through vertical and angled illumination processes, providing additional depth information of the treated surfaces. Additionally, its high numerical aperture optics and ergonomic remote control software ensure precise and controlled lens movements for accurate inspection and analysis. MSP-2300XPI also features a powerful automated inspection and review machine that efficiently processes and reviews the captured images according to user-defined parameters. The tool is optimized to automatically detect defects such as missing lines, scratches, pits, line-width variations, and voids, with extremely high accuracy and sensitivity. It further features various tools and techniques for image optimization, such as a temporal filter and color alignment algorithms, for improved accuracy and clarity of the images. The asset is also designed with several post-processing functions to ensure more flexibility in image review, such as image enhancement tools for more detailed defect analysis, image slicing and merging tools for comparison of wafers, and edge detection and line-thinning algorithms for increased contrast and visibility of patterns and defects. MPD MSP-2300XPI is an ideal choice for any organization requiring low-cost and high-quality mask and wafer inspection due to its advanced imaging and processing capabilities. It is a reliable and versatile model that combines robust performance and comprehensive image analysis functions for the most efficient defect analysis and review.