Used AIXTRON AIX 2400 G3 HT #9352602 for sale

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Manufacturer
AIXTRON
Model
AIX 2400 G3 HT
ID: 9352602
Vintage: 2004
MOCVD System 2004 vintage.
AIXTRON AIX 2400 G3 HT (Highly Tempered) is a high-performance multi-purpose reactor designed for flexible thin film deposition and advanced calibration processes in the semiconductor industry. It features a highly robust design with a spacious eight-chamber configuration and optimized chamber valves. The main components of AIXTRON AIX 2400 G3 / HT reactor include the process chambers, gas inlets, gas outlets, deposition plate, process interface and RFG substrate holders. Each chamber is designed with an individualized latching equipment, providing a secure and repeatable connection point and allowing users to quickly load and unload substrates. The process chambers are heated by an onboard hot zone system, controlled through a PID controller. AIX 2400 G3 HT reactor gas inlets feature a quick-connect design with individualized ball-valves for each gas type. All of the embedded components are connected with a stainless steel venturi nozzle to keep the processes clean and efficient. The reactor also features a comprehensive programmable auto-clean for reliable cleaning of process chambers when changing recipes or calibrations. The chamber deposition plate provides a large number of carriers for easy and efficient deposition of thin films on substrates. The RFG substrate holders are engineered for improved heating uniformity and are suitable for use in precision growth. Additionally, the reactor includes an automated process interface and a powerful RF generator with an output of 1 MHz - 13.56 MHz. AIX 2400 G3 / HT reactor is equipped with safety features to protect the unit, including an over-temperature monitoring machine and an emergency stop button that immediately halts the process. It also features high-speed and highly sensitive software with the ability to monitor and adjust the parameters in real-time. Overall, AIXTRON AIX 2400 G3 HT is a versatile, multifunctional reactor designed to meet the needs of the semiconductor industry. With its innovative design, robust construction and comprehensive safety features, this reactor is an ideal choice for high-reliability and high-performance deposition operations.
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