Used RIBER 32 #9281944 for sale

Molecular beam epitaxy (MBE) is a vacuum deposition technique that enables extremely precise physical and chemical control of thin film growth. RIBER 32 MBE equipment is a multi-source advanced MBE system designed for the growth of III-V semiconductor compounds such as gallium arsenide, indium phosphide and gallium nitride. The unit features a high power RF-plasma source, multi-gas injectors, in-situ angle-resolved XPS analyzer, in-situ mirror AR unit, and a differentially-pumped quad-mask MBE chamber. 32 is built with a quad-mask MBE chamber equipped with four-plasma sources and eight shuttered gas ports. Each quartz furnace has an independent gas flow machine for efficient mixing, allowing you to control both the composition and thickness of the thin film from one furnace to the next. This enables the growth of different material layers in a single step without having to stop the tool. In addition, it features an in-situ angle-resolved X-ray Photoelectron Spectroscopy (XPS) analyzer for monitoring the composition of the materials during the thin film growth process. The RF-plasma source included in the asset is a single-source RF generator that can be used to precisely tuned for high plasma density. The in-situ mirror AR unit provides the capability to measure optical properties such as reflectance and refractive index of the grown films in real-time. The model also features a newly developed differential pumping equipment that can be used to maintain high level of cleanliness in the system while enabling efficient gas flow. RIBER 32 also includes a powerful data control unit that enables the user to monitor all the processes in the machine in real-time. The capability to control the shutter valves, flow rates, temperatures and multiple gas sources at the same time makes it easy to precisely control the film growth. The tool also features an efficient communication asset that enables remote monitoring and control. All in all, 32 provides a highly advanced MBE model with a range of features that enables precise thin film growth. The ease of operation combined with reliable performance makes it an ideal choice for industrial applications.