Used RIBER CBE-32 #9212374 for sale

RIBER CBE-32 is a Molecular Beam Epitaxy (MBE) equipment designed with the intent to provide submicron level resolution of crystalline structures. This technique has been used for a wide variety of research, including semiconductor and nanomaterials. This MBE system is composed of a 40-degree ultimate vacuum chamber, a high-precision deposition chamber, and a detailed control unit. It is suitable for the growth of materials such as III-V semiconductors and II-VI compound layers. The ultimate vacuum chamber is designed with a hydrogen leak rate of 1x10-9 mbar liter/sec and a base pressure of 1x10-9 mbar. It is equipped with a range of features to optimize sample processing, such as an ultrahigh vacuum gate valve, a tilting sample stage, a shutter, a manipulator, a quartz crystal monitor (QCM), and a miniature electron cyclotron resonance (ECR) source. This chamber also contains two 24x30 inch multi-pocket source effusion cells, which allows for the sequential exposure of up to five sources at the same time. The deposition chamber features a three-axis linear transfer machine and a closed-loop motion control software. This chamber is designed to keep oxidation below 0.3%, and offers repeatable, precise motion control to enable step-by-step fabrication with high positional accuracy. Finally, the MBE tool incorporates a detailed control asset that allows for a wide range of parameters to be customized for each individual deposition process. The control model features graphing capabilities and user profiles, making it easy to track and modify the parameters during deposition processes. Overall, CBE-32 Molecular Beam Epitaxy Equipment provides an ideal platform for deposition of high-quality, nanometer scale features. The customization of parameters and the accuracy of the motion control system allow for unprecedented levels of material deposition, making it a valuable tool for research.