Used SVTA / SVT ASSOCIATES 440 S1 MBE #9230364 for sale
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ID: 9230364
Wafer Size: 3"-4"
Molecular Beam Epitaxy (MBE) system, 3"-4"
SVT Silicon MBE epitaxial
OMICRON Electronics included
Method: Thin-film deposition of single crystals
Transistor: Cellular phones & WiFi
Load lock:
Chamber with water cooling
Quick hatch with O-ring seal & CF copper gasket option
GP Model 204 gold seal valve (Roughing line)
Sample heater: 200° C
Heater power supply: 1000 W
Dimension heater control loop
Wafer cassette holder, 8"
(8) MO Wafer holders, 8"
Manual gate valve (VAT) (Between loadlock & intermediate chamber)
HPS Series 421 cold cathode gauge & controller (Wide range)
Cryopump UHV, 6"
Gate valve: Cryopump, 4 1/2" (Pneumatic)
(3) Sorption pumps with plastic dawars, heaters & manual valves
PIBA Venturi pump with manual valve
GP Model 275 convectron gauge with digital controller
Vacuum plumbing for roughing
Intermediate chamber:
(2) Transfer rods: Growth chamber & outgas station
Cassette storage elevator (Manual)
Ion pump 400 1/8 with PERKIN ELMER 1500 digital controller
Sublimator & controller (TSP)
Gate valve: Ion pump, 8" (Pneumatic)
GP Model 307 extended (3) gauge controllers with ionization gauge
10" Gate valve (Manual) between intermediate chamber & outgas station
Rough plumbing with GP 204 gold seal valve
(2) Viewports for docking
Outgas station:
Water cooled chamber with expansion port
Viewport with shutter
Stage
Heater 1100° C with TC
Heater power supply: 1000 W
Dimension control loop
Ion gauge
Cryopump, 8" UHV
Gate valve,10" (Pneumatic) for cryopump
Rough plumbing with GP gold seal valve for chamber
Rough plumbing with GP gold seal valve for cryopump
Growth chamber:
Dia chamber, 24" with water cooling
Sample manipulator with Z-motion & 60 RPM rotation
Passivated graphite heater, 4": 1100°C
Heater power supply: 1000 W
(7) Dimension control loops
Ion pump 400 1/8 with PERKIN ELMER 1500 digital controller
Sublimator & controller: Ion pump (TSP)
VAT Valve, 8" (pneumatic): Ion pump
Cryropump, 8" UHV
Cryropump compressor run (3) UHV pumps, 8"
Gate valve, 10" (pneumatic) for Cryropump
GP Model 307 Ion gauge controller & gauge
(2) Thermionics 156 cc single pocket E-gun with pneumatic activated
soft shutter & water shroud
L-H 4x7cc Pocket E-gun with pneumatic activated soft shutter & water shroud
15 kW E-beam power supply with (3) sweeps
(4) Standard 20cc (K-Cells) effusion cells
(2) High temperature 10cc (K-Cells) effusion cells
(4) Power supplies 1000 W for Std K-cells
(2) Power supplies 1600 W for high temperature K-cells
(6) Water cooled effusion cell shrouds with pneumatic activated soft shutters
(10) Loop dimension multi-loop controllers with relay & CPU interface
SVT Shutter controller
(2) Sentinel III flux sensors & X'tal sensor with additional beam splitter
Sentinel III deposition controller
RHEED System with power supply, shutter, screen, lead window, & controller
Option: VIEETECH 30 key / KIMBALL PHYSICS 20 kev
RGA UTI-l00C System with TEKTRONIX 5111A scope & 5A 15N & 5B1 on plugins
Movable ion gauge: Flux control
Master shutter (Pneumatic)
Rough plumbing & gold seal valves: Cryropump
Bakeout heaters, timer, fans & soft blanket
Viewports & shutters required: Docking & E-guns (Reference port schedule)
(2) Implanter port soft shutters
System upgrade chambers, 8" / Manipulator, stages & valves
(6) PBN STD Crucibles
(2) Hi-temp crucibles
CPU 386/20 MHz IBM Compatible with hardware
Water distribution panel
System console
Rough plumbing with GP gold seal valve for main chamber
Gate valve, 10" (Manual) isolate growth chamber from intermediate chamber.
SVTA / SVT ASSOCIATES 440 S1 MBE (molecular beam epitaxy) equipment is an advanced deposition platform for creating complex, ultra-thin films with extremely precise nanoscale control. The platform offers ultimate flexibility for thin-film deposition by using a highly focused and tunable beam of elemental or compound sources to suit specific applications. This Molecular Beam Epitaxy (MBE) system is based on the advanced magnetron sputtering process, which makes it a state-of-the-art epitaxy tool for the advanced thin-film deposition process. The440 S1 utilizes advanced magnetron sputtering technology and associated source control unit to achieve the highest film quality and dynamics of growth. The source is designed and powered to achieve highly uniformity, while the growth rate can be continuously modulated with inert or reactive gases in order to improve the properties of the film. The MBE enables precise control over film thickness as well as thickness profiles across the wafer, providing a uniquely homogenous platform for deposition of critical layers in semiconductor manufacturing processes. The 440 S1 includes a set of powerful accessories for epitaxy and characterization, such as an optical microscope, real-time thickness spectroscopy, RHEED (Reflech Electron Energy Loss Spectroscopy), and reflectance imaging to assess and analyse the film structure and surface morphology. There is also a high-temperature Annealing module for activating the layers to ensure optimum uniformity, crystallinity and adhesion. Additionally, the 440 S1 has a fast and reliable machine for switching between materials, providing flexibility for creating and optimizing multiple layers for specific applications. The 440 S1 also has a high efficiency gas control tool that improves reaction kinetics and further enhances uniformity. The sophisticated gas flow asset, which is integrated with the source, enables deposition of reactive elements, while the exhaust model maintains an ultra-low pressure level to ensure optimal source performance. In addition, a simple and intuitive human-machine interface provides easy access to parameters and process control. SVTA 440 S1 MBE is advanced in structure and operation and is designed to meet the highest standards in the semiconductor industry. The equipment is exceptionally reliable and is suited for high-volume production in a wide range of applications such as solar cells, LED, semiconductors, and many others.
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