Used VARIAN / VEECO GEN II #9222084 for sale

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ID: 9222084
Wafer Size: 3"
Molecular beam epitaxy system, 3" Type: Cell in: 60cc Dual filament ga cell: 125cc Cell cable 2-pol, TC (2) Cryo motor cables (4) Water pipes Pistols: N2 Cracker (With motor) (2) Trolleys, WH (5"x 3'' 2x 2'') (2) End piece manipulators Buffer chamber extension Materials used: As, Ga, In, Al, Si, Be Connector vacuums: LN2 Cables joint Shutters tangen Cage distance pieces Power cable Doping cell (Si) Ga cell sumo Pyrometer Control unit Power cable Doping cell (Neu) Si-cell heat filament defect Head mass spectrometers: Lead through defective Al-cell thermocouple defective (2) Windows (Heated) Control-PC Cage Ratchet Dual filament cell 400g Sumo cell Dual filament cell Dopant cell Mass spectrometer Control-PC Cage distance pieces (4) He-tubes Power cable LN2 Phase separator.
VARIAN / VEECO GEN II Molecular Beam Epitaxy equipment is an advanced tool designed to enable fabrication of intricate nanostructures, such as quantum dots. This deposition system uses a low-energy electron beam to create a stable layer of atoms on the target substrate. The beam energy is pre-selected by a built-in ion source that is magnetically shielded to ensure precise control and repeatability of the beam. The generated beam can vary from a fraction of an eV to several eV, making this unit good for depositing a range of materials. VEECO GEN II's unique source machine allows for special dynamic deposition effects, such as a combination of pulsed and constant beam flux, substrate heating or cooldown rates, or dynamic deposition rate and pressure variations. Additionally, the combination of an in-chamber mass spectrometer and real-time spectroscopic feedback enables precise control over the material composition of the target layer. VARIAN GEN II also features a three-axis computer-controlled motion assembly which provides sub-micron accuracy to position the sample relative to the deposition source. By controlling the sample movement and the deposition rate, users can produce structures with sharp razor-like features on the nanoscale. The tool's sophisticated computer interface and software automation provides access to complex production regimes. This automated control over deposition rate, flux, current, and substrate temperature enables the deposition of uniform layers that can reach thicknesses of less than a nanometer. Additionally, GEN II contains a wide range of safety features such as a gas safety cut off valve, pressure monitor, and vacuum alarms. This asset is also equipped with a vacuum interlock model and an LCD panel that displays the real-time process data. In conclusion, VARIAN / VEECO GEN II Molecular Beam Epitaxy is an advanced deposition equipment that allows for precise control over various parameters used in the production of intricate nanostructures. This system offers a range of unique features that give it the ability to produce extremely precise layers with sub-microscopic accuracy.
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