Used VARIAN / VEECO GEN II #9235092 for sale

VARIAN / VEECO GEN II is an advanced molecular beam epitaxy (MBE) equipment specifically designed for thin film deposition in the research and manufacturing of semiconductor materials. This system is a configuration of numerous vapor sources, varying temperatures, and automated processes which allow for precise and accurate growth of a thin film. It is ideal for single layer, multiple layer, and/or complex alloy thin film deposition of semiconductors and superlattices. VEECO GEN II consists of a main chamber powered by a base pressure of 1 x 10-10 Torr. Inside the main chamber is a heated substrate holder and an electron-beam gun; the electron gun is adjustable in height and can tilt at different angles and distances. Additionally, VARIAN GEN II includes a computer-controlled gas-handling unit with a number of independent gas sources at controlled pressure, flow rates, and temperature. Each source contains multiple shutters to independently regulate the flow to, from, and within the main chamber. It is capable of depositing single-layer, multiple layers, and complex alloys that require precision and accuracy. Deposition rate control and flux uniformity are achievable via the sophisticated showerhead design. Its grounded shield protects the substrate from ions and particles that can be scattered from the vapor sources. Additionally, GEN II is compatible with a variety of thin film analysis tools. The machine further provides the flexibility and convenience necessary for a broad range of research needs. This is achieved through its retractable planar design, robust gas-handling tool, and electron gun's ability to tilt and move freely around the main chamber. Its design also allows for an automated process, which allows technicians to both deposit thin films and analyze them with the same asset. In conclusion, VARIAN / VEECO GEN II is an ideal model for precise thin film deposition and thin film analysis. Its unique features and robust design allow it to be used for a variety of research applications and processes. The equipment's retractionable planar design, precise temperature control, and automated processes can provide accurate thin film for the fabrication of complex semiconductor materials.