Used VARIAN / VEECO GEN II #9238934 for sale

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VARIAN / VEECO GEN II
Sold
ID: 9238934
Wafer Size: 4"
MBE System, 4".
VARIAN / VEECO GEN II is a molecular beam epitaxy (MBE) equipment that is used to deposit thin layers of organic and inorganic materials on substrates, enabling researchers to produce high-precision nanostructures with amazing control and accuracy. The system is able to deposit layers starting from a few angstroms thick up to about one micrometer thick and can be used for a variety of materials, including semiconductors, metals, polymers, and nanostructures. MBE systems work by vaporizing materials at high temperatures in an ultra-high vacuum, then depositing the vapor onto a cooled substrate. In VEECO GEN II MBE unit, the vacuum chamber is divided into three sections: the load lock, the main chamber, and the substrate preparation chamber. The sample is placed into the load lock, the environment is pumped down to a desired vacuum level, and then the sample is transferred into the main chamber. Once there, the substrate is heated to a desired temperature and the evaporants are introduced, typically through a Knudsen cell or an electron beam. As the material is vaporized within the chamber, it is directed at the surface of the substrate. The deposited film is then slowly cooled, and annealed in order to form the desired nanostructure. The machine also includes numerous features that allow for greater control over the deposition and film formation processes. For example, VARIAN GEN II has a high-precision chopper tool that makes it possible to vary the thickness of the film and the deposition rates, as well as a sample rotation stage, and a gas delivery asset which allows for precise control of the gas environment in the chamber. Additionally, the model includes a range of beam shutters, allowing for the deposition of inorganic or organic metals, or precise control over the distribution of species in the deposition. GEN II MBE equipment is an invaluable tool for researchers looking to add precision and control to their nanostructures. Its features offer users the ability to create high-performance nanostructures with exacting control, allowing for applications in fields such as microelectronics, photonics, and materials science.
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