Used CREST 4HT-710-3 #179202 for sale

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ID: 179202
Stainless Steel Heated Ultrasonic Cleaning Tank with Controller Genesis Tru-Sweep 4G-250-3 simultaneous multi-frequency ultrasonic generator Vibra-Bar transducerized tank Inside Dimensions: 10" L x 7" W x 10" D 120V, 50/60 Hz, 8A.
CREST 4HT-710-3 is an advanced other wafer processing equipment designed for cutting-edge semiconductor fabrication. It uses advanced robotics, vacuum chambers, and gas flows to enable the efficient, precise manipulation of wafer materials. The main components of 4HT-710-3 are a robotic arm, an automated vacuum chamber, a hotplate, and a CVD system. The robotic arm is capable of carrying out complex operations, such as cutting, rotating and transferring wafer materials. The vacuum chamber is equipped with a range of devices, such as load locks, a turbo molecular pump, a diffusion pump, and a gas feed unit, to accurately control the environment of a wafer processing machine. A hotplate ensures uniform heating, while the CVD tool provides a place for highly precise chemical vapor deposition (CVD) of materials on the wafers. The combination of these components allows for precise handling, manipulation and deposition of wafer materials during the fabrication process. CREST 4HT-710-3 is programmable and allows for automated handling and deposition of even the most intricate designs. It's able to perform a range of operations such as manual placement of pieces for doping, photolithography, chemical etching, acid baths and more. Thanks to its unique design, 4HT-710-3 can perform these processes automatically and with extreme precision. The asset is extremely reliable, offering repeatable and accurate results, while its easy-to-use interface allows inexperienced users to quickly get familiar with the model. It is also designed to be easily maintained and serviced by technicians, with a selection of certified parts and consumables available to ensure its long-term use. In conclusion, CREST 4HT-710-3 is an innovative other wafer processing equipment that makes the operations required for semiconductor fabrication faster, simpler, and more reliable. Its advanced robotics, vacuum chambers, and CVD systems make it a formidable tool for meeting modern fabrication demands.
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