Used TEL / TOKYO ELECTRON Certas WING #9240030 for sale

TEL / TOKYO ELECTRON Certas WING
ID: 9240030
Dry cleaning system.
TEL / TOKYO ELECTRON Certas WING is a precision asher and etcher designed for the production of high quality semiconductor and compound semiconductor products. It is a multi-function precise etcher that utilizes a precise and clean chemical etch to selectively remove material from the wafer. The equipment has an ultra-short process time, allowing users to quickly and precisely remove components from a wafer without damaging the underlying structure. TEL Certas WING is a multi-chamber process chamber system designed for the highest level of process flexibility and reliability. The unit features an efficient and repeatable wafer cleaning cycle and precise gas flow control for uniform etching in high precision locations. The WING etcher has a large user-programmable operating region allowing for optimized process recipes according to the user's needs. The WING also has adjustable, optional etching speed to allow processing of high aspect ratio materials. The WING machine also features an integral passivation tool which eliminates the need for a separate passivation process. This passivation is done through the use of low pressure plasma, offering superior uniformity around the entire etched wafer. Additionally, the WING comes with advanced components such as beam emission, four-sector process/endpoint control, and constant flow end point control. The WING asset is highly integrated, allowing for efficient data exchange and communication. The model is designed to allow simultaneous communication of up to four areas, meaning multiple processes can be monitored simultaneously. The built-in computer with the help of real-time data analysis ensures process consistency and reproducibility. In a nutshell, TOKYO ELECTRON Certas WING is an efficient, precise, and reliable etcher designed for the highest level of production of semiconductor and compound semiconductor products. It has a faster process time than many alternatives, advanced process/endpoint control features, efficient passivation equipment, and concurrent data exchange and communication abilities.
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