Used TEL / TOKYO ELECTRON UW-200Z #9124710 for sale

TEL / TOKYO ELECTRON UW-200Z wet station is a high-precision cleaning and drying equipment for pieces of semiconductor substrates. It offers reliable performance and efficient operation to ensure uniform, consistent, and aesthetically pleasing results. The wet station provides a comprehensive solution for degreasing, etching, and drying processes for various types of substrate materials. The station features a slim, 733-mm depth, one-piece construction to allow maximum economy of space in the front of a laboratory or production line. TEL UW200Z has been designed for optimum process efficiency and consistency, allowing consistent performance with minimum operator intervention. TOKYO ELECTRON UW 200 Z wet station features a reliable dual-waveform AC supply power source for greater process flexibility. It can be used for degreasing, etching, and drying processes with additional user-selected functions such as back dry cleaning, lock-in and field plate (Fplate) wash. The dual-waveform AC supply enables precise control of the temperature for more consistent surface drying. The addition of a plate-heating function helps to minimize heat-loss and ensure accurate temperature control. TEL UW-200Z offers two customizable cleaning processes: low-temperature cleaning and high-temperature cleaning. The low-temperature cleaning process starts with a degreasing step followed by a cold rinse and a hot rinse. This process reduces the amount of chemicals and energy required. The high-temperature cleaning process adopts a back-door connection and involves an acid degreasing step followed by a hot rinse, and the etching process is performed using hot water. For drying, TEL UW 200 Z features a trust-in-drying plan that maximizes drying speed and minimizes adhesion of foreign matter. The trust-in-drying plan works by using the airflow generated during the cleaning process and by combining the air with heating. The heated air increases the effectiveness of the drying process and minimizes the risk of defects. UW-200Z is also equipped with an optional air knife system to separate the particle and liquid of the substrate. The air knife unit works by using a high-pressure airflow to separate the liquid and particle, enabling the substrate to dry faster and with greater efficiency. Overall, TEL / TOKYO ELECTRON UW200Z wet station is an advanced and reliable cleaning and drying machine designed to meet the ever-increasing demands for quality components in the semiconductor industry. It offers process flexibility, precise temperature control, two customizable cleaning processes, and an efficient trust-in-drying plan for exceptional surface drying.