Used BREWER SCIENCE CEE 100 #9265628 for sale

BREWER SCIENCE CEE 100 photoresist is a chemically amplified, negative-working, dry film resist system designed to serve the needs of the microelectronic, micro-mechanical and optics industries. It provides a high resolution and high yield with low post exposure delay, superior imaging process latitude, and minimal line width and line edge roughness. The resist is composed of two different components, the resin and the developer. The resin is typically a polymers that carries a negative charge, with an ionic bonding surface activation additive. This combination helps the photoresist absorb light, which creates a latent image. In its resist form, the resin is applied in a thin layer on top of a substrate, such as a wafer. When exposed to light of a certain ultraviolet wavelength, the resin absorbs the light and becomes a solids mass, which is the wet image. The developer is then applied to the wet image and remains on the exposed areas, so that only the unexposed areas are covered in the developer. The developer helps remove the non-exposed sections of the resist to reveal an image of the original pattern. The advantages of BREWER SCIENCE CEE-100 photoresist are its process latitude and low post exposure delay. It has high resolution, with a minimum feature size of 0.5 um, and high yield. It has minimal line and edge roughness and provides excellent imaging. It also has a long shelf-life and is relatively easy to process. Process latitude is extremely important for photolithography as it ensures that high resolution images can be produced regardless of the exposure conditions. CEE 100 photoresist is suitable for a variety of applications, including reticle masks and step and scan masks, microelectromechanical systems (MEMS), optical disks, logic and memory chips, thin film transistor (TFT) frames and power semiconductor chips. It is also used for high energy electron beam lithography, low energy electron beam lithography and liquid immersion lithography. In conclusion, CEE-100 photoresist is an ideal product for those seeking high resolution images with minimal post exposure delay, while also having minimal line width and line edge roughness. It is suitable for both short-term and long-term performance requirements while being easy to process. Its long shelf life makes it an ideal choice for a wide range of applications.