Used BREWER SCIENCE CEE C100 #9192231 for sale

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Manufacturer
BREWER SCIENCE
Model
CEE C100
ID: 9192231
Manual coater Spin coating system.
BREWER SCIENCE CEE C100 (Chemically Enhanced Etching) is a photoresist equipment used to support etched features in micro-fabrication processes. This system uses a unique process to bond a resin-based resist to the material being etched. Rather than relying on an absolute chemical attachment of the film - as is the case with traditional photoresists - CEE C100 unit employs a specifically designed precursor for reactive intermediates to improve bonding of the resist to the substrate. BREWER SCIENCE CEE C100 machine was engineered to implement the capabilities of traditional photoresists while adding improved tear resistance, improved adhesion relative to the Substrate, and superior chemical etching resistance. The better adhesion of the resist to the substrate allows for increased etch window accuracy and more resolution for etched features. To begin the process, the material surface is prepared to maximize the chemical interaction between it and the photoresist layer. After degreasing the surface, a proprietary precursor is applied and then allowed to react with the surface. This reaction helps to bond the resist layer firmly to the substrate, creating the ideal layer for etched features. The photoresist layer is then exposed to the patterning light source in the desired shape. Exposed areas become chemically inert and solubility protected from the etching chemicals, while unexposed areas remain exposed to etching media. The etching process is then allowed to proceed to the desired depth and shape of the desired feature. After the etching process is completed, the remaining photoresist layer is stripped away from the substrate to complete the working feature. CEE C100 tool provides up to 20x improved etch resistance from traditional resists, with improved etch window accuracy and cleaner features being etched. Overall, BREWER SCIENCE CEE C100 asset stands to improve etching accuracy, resolution, chemical etch resistance, adhesion, and self-leveling of photoresists. The increased etch window accuracy, more uniform etching depth, and increased yield make this model an ideal choice for those looking to increase accuracy and repeatability for their micro-fabrication needs.
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