Used CALI-TECH CT-608D #9252347 for sale
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CALI-TECH CT-608D is a photoresist equipment designed for advanced UV-based lithography processing. This system is used to deposit and develop advanced thin film materials in order to create high-performance circuits and devices with smaller feature sizes. CT-608D is designed to provide a high resolution photolithography process that is suitable for both research and industrial applications. Its core components include an exposure unit, development machine, post-development treatment tool, and an automated asset for wafer handling. The exposure model consists of a large format UV intense array of light emitting diodes (LEDs) with a wavelength range of 365nm to 395nm. The wavelength range permits flexibility when selecting the photo-resist layers as well as allowing the implementation of multiple exposure techniques. The development equipment features a double-stage, high speed wet development system, which is capable of carrying out photo-resist development while keeping the temperature of the photo-resist below a certain level. This is especially important for ultra-thin photo-resist processes, where the temperature must be below a certain threshold in order to avoid damage to the photo-resist. The post-development unit consists of a spin-rinse-dry module. It is used for rinsing off the photoresist and drying it before further processing. The automated wafer handling machine provides a highly automated workflow and can handle up to 30 wafers at one time. It is fully compatible with advanced wafer transfer robots. The performance of CALI-TECH CT-608D has been proven in various lab and industrial settings. It is capable of handling ultra-thin photo-resist layers with a minimum feature size of 2 microns. It is highly reliable and efficient and is ideal for production processes in the advanced lithography industry.
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