Used CARL ZEISS ZBA 21 #9208417 for sale

CARL ZEISS ZBA 21 photoresist equipment is an advanced resist system with an industry-leading depth of focus for precision imaging. This unit optimizes a wide range of lithography applications from advanced substrates to specialty applications and is compatible with select exposure wavelengths. It features an automated vision machine based on computer vision technology with a CCD camera which makes it highly suitable for both R&D and manufacturing. This feature enables high precision alignment control and automated focus optimization. Additionally, the software is capable of intelligently adjusting for substrate and resist type, layer thickness, and other features which may affect the tool's performance. ZBA 21 has a process speed of up to 650 wafers per hour, with a repeat accuracy of 3 µm in XY direction and a fine pitch capability of 15 µm on 6" wafers. Its exposure wavelength range is from 157nm to 400nm, which further optimizes the asset for device performance enhancement, overlay registration, and other production requirements. In addition, the photoresist model provides better uniformity and line width control with its advanced technological capabilities such as the tunable spectrum feature that allows users to choose and adjust the right exposure wavelength for their specific needs. Its dynamic imaging technique also enables users to optimize imaging modes from deep to shallow depths. CARL ZEISS ZBA 21 combines high precision imaging technology and automated features to provide users with superior photolithography performance with targeted features. Its software interface design, data analysis, and self-diagnostics further allow users to streamline their workflow and make decisions with confidence. This makes it a great choice for a wide range of engagements.