Used CONVAC CBA-3–3 M-2000 #9016683 for sale

CONVAC CBA-3-3 M-2000 is a photoresist equipment used for achieving precise lithography patterns on semiconductor and microelectronic components. It is used to facilitate a variety of patterning applications like sampling, masking, etching, and imprinting. The primary component of the photoresist system is the conformal pump, which is designed to use a liquid or gas mixture to create a high-contrast image on the surface of a workpiece. The pump itself is capable of applying various thicknesses of photoresist, ranging from 20 to 500nm thick, regardless of the substrate shape. The pump is also capable of achieving uniform coverage from as narrow as 5 μm to as wide as 1mm, making it suitable for a variety of lithography applications. The user can modify the set parameters of the conformal pump to produce different photoresist patterns. This is achieved by adjusting the exposure time and thickness, as well as the type of resist. After the photoresist has been applied, the photomask is illuminated and the exposed areas of the photoresist are developed. This causes the photoresist in these areas to become removed, revealing the substrate below. The remaining photoresist can then be removed and replaced with a newly created material. Additionally, CONVAC CBA-3-3 M-2000 photoresist unit is equipped with numerous safety features, such as automatic shut-offs and auto alarms to alert the user if parameters have been changed outside the operational range. It also is capable of certain real-time monitoring, allowing users to review and adjust processing parameters as needed. This helps ensure optimal repeatability and consistency between applications. All in all, CONVAC CBA-3-3 M-2000 photoresist machine offers users a reliable and accurate means for achieving complex lithography patterns. It provides precision control over the application of photoresist, allowing users to customize patterns to their exact requirements. Finally, its enhanced safety features ensure that users always remain informed of its operational parameters and can adjust them as needed.