Used DNS / DAINIPPON 60A #9162932 for sale

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Manufacturer
DNS / DAINIPPON
Model
60A
ID: 9162932
Wafer Size: 6"
Vintage: 1996
Developer system, 6" 1996 vintage.
DNS / DAINIPPON 60A is a photoresist equipment for use in semiconductor processing. It is designed to provide high-resolution patterns on silicon wafers with the aid of light-sensitive materials. The system is based on a PAA (Photoresist Acid-Antagonistic) technology, which is a combination of photo-resist precursors and alkaline components. This combination allows for fine resolution patterns on the surface of the wafer by controlling the light exposure to the photoresist. The unit consists of the photoresist, the exposure unit, the developer, and a spinning unit. The photoresist used in DNS 60A is a liquid resin that is mixed with an oligomer that reacts to light. When the wafer is exposed to light, the oligomer will cause a change in the solubility of the photoresist, allowing certain areas to be affected by a developing solution. The exposure unit is comprised of a digital projection lens, a shutter, a linear stage, a quartz lamp, and a controller. This unit projects light onto the wafer at different intensities and angles. The developer is a special solution that is used to remove unwanted areas of photoresist, leaving the patterned area on the wafer where the light had been exposed. Lastly, the spinning unit is used to mechanically spin the wafer at a predetermined speed and time to evenly coat the surface with the photoresist. DAINIPPON 60A is useful for fabricating semiconductor components with high accuracy and efficiency. It can achieve precision patterns with a minimum feature size of 50 nanometers. The machine can also support high throughput because of its ability to transfer multiple patterns onto one wafer in a single spin-coating process. Additionally, the photoresist is environmentally friendly, which is desirable for many industrial applications. Overall, 60A photoresist tool is an effective and efficient tool for creating precision patterns on semiconductor wafers. It is easy to use and can produce results with very fine resolution. Additionally, it is environmentally friendly, making it a favorable choice for industries looking for eco-friendly solutions.
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