Used DNS / DAINIPPON 629 #9272101 for sale
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ID: 9272101
Coater / Developer system, 6"
Specifications:
Variety: Coater
Loader / Unloader
Step motor driving system
Individual unit control
I/H Unit, 6"
Material of wafer handling arm: SUS304 (Modified)
Wafer loading method: Handling arm with vacuum
Digital wafer sensor
Step motor driving system
Bake, 6"
Bake type: HP+CP (H.M.D.S)
Wafer loading method: Wire moving with cylinder
Spin unit (Develop):
Wafer size: 6"
Develop type: Rotation spray with spin motor
Chemical liquid discharge method: N2 Pressurization
Wafer chuck size: 70 mm
Spin cup:
Upper: PolyPropylene resin, 8"
Lower: PolyPropylene resin
Nozzle type: Spray nozzle type
Exhaust control system
Spin cover: Transparent acrylic
Spin motor RPM: Maximum 6000 RPM
Waste liquid drain: Natural drain
Wafer moving: Moving with step motor
Spin unit (Coater):
Wafer size: 6"
Coating method: Rotation with spin motor (Maximum 6000 RPM)
P/R Discharge method: Bellows pump
Wafer chuck size: 70 mm
Spin cup:
Upper: PolyPropylene resin, 8"
Lower: PolyPropylene resin
2 Nozzle type (1/8") / Track
Exhaust control system: Manometer installed
Spin cover: Transparent acrylic
Spin motor RPM: Maximum 6000 RPM
P.R Dispense (maximum): 20 cc / 1 Stock
Waste liquid drain: Manual drain
Wafer moving: Moving with step motor
Bake:
Wafer size: 6"
Bake type: H.P 2-Stage
Bake temperature (maximum): 250°C
Wafer moving: Moving with cylinder
Utility specifications:
Main power:
AC 110 V / 30 A / Single phase
AC 220 V / 30 A / Single phase
Air pressure: 4~5 Kg/Cm²
N2 Pressure: 3~4 Kg/Cm²
Vacuum pressure: 60~70 Cm Hg
Spin exhaust: 100 mm (20 mm Hg)
Bake exhaust: 70 mm (20 mm Hg)
Variety: Develop
Composition
Loader I/H unit develop
I/H Unit unloader
Unit configurations:
Loader / Unloader
Wafer size: 6"
Step motor driving
Individual unit control
I/H Unit:
Wafer size: 6"
Material of wafer handling arm: SUS304 (Modified)
Wafer moving method: Arm with vacuum
Digital wafer sensor
Step motor driving
Spin unit (Develop):
Wafer size: 6"
Develop method: Rotation spray with spin motor
Chemical liquid discharge method: N2 Pressurization
Wafer chuck size: 70 mm
Spin cup:
Upper: PolyPropylene resin, 8"
Lower: PolyPropylene resin
Nozzle type: Spray nozzle type
Exhaust control system: Manometer installed
Spin cover: Transparent acrylic
Spin motor RPM: Maximum 6000 RPM
Waste liquid drain: Natural drain
Wafer moving method: Moving by step motor
Utility specifications:
Main power:
AC 110 V / 30 A / Single Phase
AC 220 V / 30 A / Single Phase
Air pressure: 4~5 Kg / Cm²
N2 Pressure: 3 ~ 4 Kg / Cm²
Vacuum pressure: 60~70 Cm Hg
Spin exhaust: 100 mm (20 mm Hg).
DNS / DAINIPPON 629 is an innovative photoresist equipment developed by DNS Screen Mfg. Co. Ltd., designed to improve factory efficiency and reduce operating costs. The system is composed of three components: a photoresist material, a developer, and an exposure source. The photoresist material is a light-sensitive solvent-dissolved polymer which hardens when exposed to certain wavelengths of light. The developer acts as a solvent and removes the photoresist material where it was not exposed. This allows for patterns to be formed from the photoresist material. Lastly, the exposure source is an irradiation unit designed to emit a specific wavelength of light to expose the photoresist material. The machine works by spraying a film of the photoresist material onto the substrate material. The exposure source is then used to expose the photoresist material and the developer is used to remove the areas of photoresist material that were not exposed. This creates patterns which can be used for a variety of purposes such as creating a stencil for screen printing onto textiles. DNS 629 tool offers several advantages over traditional photolithography. It requires fewer and less expensive components, is easy to set up, and requires less maintenance. Additionally, the photoresist material is highly accurate, offering as little as one percent deviation in the patterns which is much better than the 3-5 percent range offered in traditional photolithography. The asset additionally offers a great deal of flexibility in terms of successfully printing intricate patterns. It works well with a variety of substrates, from paper and fabric to glass and ceramics, and can handle a wide range of photoresist materials with ease. All in all, DAINIPPON 629 model is a great choice for factories looking to reduce costs and improve efficiency. It can produce intricate and detailed patterns with high accuracy and flexibility, making it an ideal choice for many applications.
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